Re: in-house tungsten CMP

thanks a lot. 


[EMAIL PROTECTED] (John Damiano) wrote in message news:<[EMAIL PROTECTED]>...
> Jzhao,
> 
> Polishing W with selectivity to SiO2 is fairly common at the ILD0
> level (contact plug or local interconnect levels).  Check with Rodel -
> they have several products and can probably provide guidance w.r.t.
> the appropriate pads, pad conditioner, slurry, etc.
> 
> website: http://www.rodel.com/rodel/products/CMP.asp?caid=322
> 
> Good luck
> 
> John Damiano
> Protochips Inc.
> 
> [EMAIL PROTECTED] (jialin zhao) wrote in message news:<[EMAIL PROTECTED]>...
> > Dear all,
> > I have some difficuty developing our in house CMP process. We plan to
> > set up a CMP process of our own in the clean room. Basically we want
> > to polish sputtering W by hand.  we are buying wafer holder, polishing
> > cloth, polishing pad, slurries, etc now. I wonder if anyone has
> > experience and would give suggestions. I specifically interested in
> > which kind of slurry have high selectivity over thermals silcion
> > oxide.
> > thanks a lot. 
> > my email is [EMAIL PROTECTED]