Q: First papers on reactive ion etching profile simulations?

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Dear colleques,

I am just reading some papers on profile simulations for reactive ion
etching.
I was wondering who were the first groups working on, and which were
the first papers published on this topic.
I have the papers by Ulacia, Petti and McVittie from 88/89, and papers
by Reynolds, Neureuther and Oldham [J.Vac.Sci.Technol 16(6), 1979] and
by N.S. Viswanathan
[J.Vac.Sci.Technol. 16(2), 1979].
I was wondering if there were any earlier papers about the profile
simulation of RIE (reactive ion etching).
If you know of (or just remember vaguely) some earlier or just early
such papers, could you tell me some bibliographic informations?
Both Reynolds et al. and Viswanathan make reference to a paper by
Jewett, Hagouel, Neureuther, and Van Duzer (Polymer Eng. Sci. 17,
1977) (V. makes reference to the conference talk), however, in the
context of the string algorithm. Unfortunately, I don't have access to
this journal. Does
this paper by Jewett et al. deal with  reactive ion etching profile
simulations, or is it "just" about algorithms and isotropic etching?

Thanks a lot in advance!
Burkhard

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