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Peter Simon wrote: >snip
amorphous.
This deposition is going to occur in a vacuum, due to ion bombardment of a molybdenum surface, at temperatures that vary over the range of 90 to 400 K.
I have found a paper (R. C. Hansen and W. T. Pawlewicz, "Effective conductivity and microwave reflectivity of thin metallic films," IEEE Trans. Antennas Propagat., vol 30, no 11, Nov 1982) that shows how to calculate the effective conductivity of a thin metallic layer given the bulk conductivity sigma_0 and the electron mean free path length L (in the bulk metal). The calculation is based on earlier work by Fuchs, Sondheimer, and Campbell. Hansen and Pawlewicz do not provide any comparison with measurements, but state that "this model fits polycrystalline films reasonably well" along with the claim that "most thin films will be polycrystalline." They provide an example calculation for a gold (Au) film, using the values of sigma_0 = 4.1e7 S/m and L = 570 Angstrom, which I assume are both valid at room temperature, approx. 300 K.
My questions:
1. Should I expect the deposited Mo layer to be polycrystalline, so that the Hansen/Pawlewicz formulas are valid? If not, how to proceed?
Thanks very much,
Peter Simon peter underscore simon at ieee dot org (return email address is a spam trap)
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