Usenet.com

www.Usenet.com

Group Index

Sci Thread Archive from Usenet.com

<-- __Chronological__ --> <-- __Thread__ -->

Re: RF Conductivity of thin Mo film





Peter Simon wrote:
>snip


, or
amorphous.

This deposition is going to occur in a vacuum, due to ion bombardment
of a molybdenum surface, at temperatures that vary over the range of
90 to 400 K.

I have found a paper (R. C. Hansen and W. T. Pawlewicz, "Effective
conductivity and microwave reflectivity of thin metallic films," IEEE
Trans. Antennas Propagat., vol 30, no 11, Nov 1982) that shows how to
calculate the effective conductivity of a thin metallic layer given
the bulk conductivity sigma_0 and the electron mean free path length L
(in the bulk metal).  The calculation is based on earlier work by
Fuchs, Sondheimer, and Campbell.  Hansen and Pawlewicz do not provide
any comparison with measurements, but state that "this model fits
polycrystalline films reasonably well" along with the claim that "most
thin films will be polycrystalline."  They provide an example
calculation for a gold (Au) film, using the values of sigma_0 = 4.1e7
S/m and L = 570 Angstrom, which I assume are both valid at room
temperature, approx. 300 K.

My questions:

1. Should I expect the deposited Mo layer to be polycrystalline, so
that the Hansen/Pawlewicz formulas are valid?  If not, how to proceed?


Look sputtering Mo and the deposit of it on a surface can lead to many different crystalline structures. These structures as you rightly point out depends on temperature, sputtering rates, co-sputtering of the film, the kinetic energy of the clusters and ions hitting the film, the energy and type of ions used to sputter from the target, and the rate of sputtering. The best way I believe to get accurate estimates of the properties you desire is to just make the film in an environment as close as you can to the space environment and then measure the DC resistivity versus temperature and use that in your calculations. Also, remember Mo may oxide over long periods in space do to atomic oxygen. This will change the reflectivity of the film.

Measuring the DC resistivity only requires a closed cycle refrigerator,
a temperature controller, dc constant current source, a nanovoltmeter, some connectors, a Si-thermometer. If you want it automated then you need a 486 computer with an IEEE-488 card for controller and limited programming skills.



Thanks very much,

Peter Simon
peter underscore simon at ieee dot org
(return email address is a spam trap)




<-- __Chronological__ --> <-- __Thread__ -->


Usenet.com



Please check out one of the premium Usenet Newsgroup Service Providers below for access to Usenet.